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New Media Art and Post-human Masks

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Culture and Computing (HCII 2022)

Part of the book series: Lecture Notes in Computer Science ((LNCS,volume 13324))

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Abstract

In this paper, from the perspective of posthumanism and by centering on the dialectical relationship of binary unity of opposites between mask and body, the new style presented by mask art under the intervention of new media art was studied. The characteristics of remote presence, face structure and sensory augmentation of post-human mask were summarized from the perspective of detachment, embodiment, and augmentation presented by the new media art presents the characteristics, which sets up the theoretical interpretation premise and thinking paradigm for the creative practice of body and mask art of new media art.

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Authors and Affiliations

  1. Communication University of China, Beijing, China

    Hantian Xu, Lin Zhang & Ziruo Xue

Authors
  1. Hantian Xu
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  2. Lin Zhang
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  3. Ziruo Xue
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Corresponding author

Correspondence to Lin Zhang .

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Editors and Affiliations

  1. Eindhoven University of Technology, Eindhoven, The Netherlands

    Matthias Rauterberg

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Xu, H., Zhang, L., Xue, Z. (2022). New Media Art and Post-human Masks. In: Rauterberg, M. (eds) Culture and Computing. HCII 2022. Lecture Notes in Computer Science, vol 13324. Springer, Cham. https://doi.org/10.1007/978-3-031-05434-1_24

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  • DOI: https://doi.org/10.1007/978-3-031-05434-1_24

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  • Publisher Name: Springer, Cham

  • Print ISBN: 978-3-031-05433-4

  • Online ISBN: 978-3-031-05434-1

  • eBook Packages: Computer ScienceComputer Science (R0)

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