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Nanoparticle-based lift-off technique for ultra-thin nanoporous film preparation

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Abstract

Ultra-thin membrane with nanoscale through hole has great potential in biomedical applications, where precise controllability of porosity, pore size and film thickness is urgently required. The present work proposed a cost-effective way to prepare the ultra-thin nanoporous film with a promising controllability. Monodispersed nanoparticle, rather than photoresist, is used as the sacrificial material for this new lift-off process. By releasing the particles, holes can be achieved with predetermined characters. A 110 nm-thick nanoporous aluminum film with well-controlled pore’s diameter was successfully fabricated to validate the technique. The technique has wider process window and better applicability than other nanofabrication methods.

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Authors and Affiliations

  1. National Key Laboratory of Nano/Micro Fabrication Technology, Institute of Microelectronics, Peking University, Beijing, 100871, China

    Wei Wang, Yu Zhao, YinHua Lei & ZhiHong Li

Authors
  1. Wei Wang
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  2. Yu Zhao
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  3. YinHua Lei
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  4. ZhiHong Li
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Corresponding author

Correspondence to ZhiHong Li.

Additional information

Supported by the National Natural Science Foundation of China (Grant Nos. 60606014 and 90607004)

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Wang, W., Zhao, Y., Lei, Y. et al. Nanoparticle-based lift-off technique for ultra-thin nanoporous film preparation. Sci. China Ser. F-Inf. Sci. 51, 819–824 (2008). https://doi.org/10.1007/s11432-008-0055-8

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  • DOI: https://doi.org/10.1007/s11432-008-0055-8

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