Kinetic plasma simulations for three dielectric etchers

doi:10.1016/j.cpc.2007.02.070

Computer Physics Communications

Volume 177, Issues 1–2, July 2007, Pages 122-123

https://doi.org/10.1016/j.cpc.2007.02.070 Get rights and content

Abstract

Particle-in-cell Monte Carlo collision (PIC/MCC) modeling of dual frequency asymmetric capacitively coupled plasma (CCP) sources has been carried out. In particular, the following configurations have been modeled: 27/2 MHz system with an electrode separation of 2 cm, 60/2 MHz system with a gap of 4.5 cm, and 162/13.56 MHz system with a gap of 3.2 cm. It is found that both the ion flux to the electrode and the ion bombardment energy can be controlled independently in dual-frequency CCP (DF-CCP). Through kinetic modelings, many of the kinetic characteristics of the plasma discharge of three major dielectric etchers are compared.

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Acknowledgements

This work was supported by the Korean Science and Engineering Foundation through its Center of Excellence Program under Grant No R11-2000-086-0000-0 and the Korean Ministry of Education through its Brain Korea 21 program.

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Kinetic plasma simulations for three dielectric etchers

Abstract

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Acknowledgements

J. Vac. Sci. Technol. A

Appl. Phys. Lett.