Elsevier

Microelectronics Journal

Volume 39, Issues 3–4, March–April 2008, Pages 494-498
Microelectronics Journal

Comparative investigation of optical and structural properties of porous SiC

https://doi.org/10.1016/j.mejo.2007.07.114Get rights and content

Abstract

Paper presents results of the non-destructive characterization of porous SiC (PSiC) layers using atomic force microscope, Raman scattering, scanning electronic and X-ray diffraction spectroscopes. A comparative study of the Raman spectroscopy on the PSiC layers prepared at the different technological routine with the variation of the nanocrystallite sizes and the thickness of PSiC layers has shown a number of new features specific for nanocrystallite materials. The latter stimulates the modification of Raman scattering spectra, which have been discussed.

Introduction

It is well known that SiC is promising for substitution of silicon in microelectronics industry, especially in high power, high frequency, and high temperature devices [1]. SiC nanocrystals (NCs) have been studied extensively in the last 10 years as very interesting object for potential application as nanoscale blue light emitters [2]. It was shown later some prospective applications of SiC-based homoepitaxial or GaN-based heteroepitaxial device structures formed on porous SiC (PSiC) substrates with improved quality [3], [4], [5]. Despite the technological progress, the fundamental properties of SiC nanocrystallite structures and methods of its non-destructive characterization are under developed. Thus, the SiC-NC structure investigation and development of characterization techniques are of much interest.

Section snippets

Samples and methods

The PSiC layers were formed by surface anodization of n-type 6H–SiC substrate with resistivity of 0.052 Ω cm and orientation (0 0 0 1) in 3% aqueous solution of HF at dc current densities of 4, 8, 16, 27, and 80 mA/cm2 and process duration of 3 min without external illumination (Table 1). Each sample contained a porous layer and non-porous part. Raman spectra were measured in the backscattering configuration using a Labram–Dilor micro-Raman spectrometer at room temperature and using He–Ne laser

Experimental results and discussion

Typical AFM and SEM images of the PSiC samples are presented in Fig. 1, Fig. 2. Surface roughness of a PSiC layer is estimated from AFM planar and cross-sectional studies. The surface roughness of the PSiC layer increased up to 100–200 nm with increasing of etching current densities (Fig. 1). We estimated the thickness of PSiC layers, presented in Table 1, and an average diameter of pores (100–150 nm) on the base of SEM cross-sectional images (Fig. 2). With increase of etching current densities

Acknowledgment

This work was supported by SIP-IPN, Mexico.

References (11)

  • S.E. Saddow et al.

    Growth of SiC

    Appl. Surf. Sci.

    (2001)
  • J.C. Zolper et al.

    Advances in silicon carbide electronics

    MRS Bull.

    (2005)
  • L.-S. Liao et al.

    Intense blue emission from porous β-SiC formed on C+-implanted silicon

    Appl. Phys. Lett.

    (1995)
  • A. Sagar et al.

    Plasma assisted molecular beam epiraxy of GaN on porous SiC substrate with varing porosity

    J. Vaccum Sci. Technol.

    (2003)
  • M. Mynbaeva, A. Sitnikova, A. Trigubova, K. Mynbaev, HVPE GaN growth on porous SiC with closed surface porosity, J....
There are more references available in the full text version of this article.
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