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InP HEMT Technology for High-Speed Logic and Communications
Tetsuya SUEMITSU Masami TOKUMITSU
Publication
IEICE TRANSACTIONS on Electronics
Vol.E90-C
No.5
pp.917-922 Publication Date: 2007/05/01 Online ISSN: 1745-1353
DOI: 10.1093/ietele/e90-c.5.917 Print ISSN: 0916-8516 Type of Manuscript: Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices) Category: Compound Semiconductor and Power Devices Keyword: HEMT, InP, cutoff frequency, OEIC,
Full Text: PDF(990.1KB)>>
Summary:
As a review of the InP HEMT technology and its applications to logic ICs, the two-step-recess gate structure, which is now widely used in high-performance InP HEMTs, and its application to optoelectronic ICs are described. This paper also covers the topic of the gate delay analysis that reveals that the parasitic delay becomes the primary cause of the gate delay in sub-100-nm gate regime. For future challenge for logic applications, ways to reduce the off-state transistor current is also discussed.
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