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Cell Library Development Methodology for Throughput Enhancement of Character Projection Equipment Makoto SUGIHARA Taiga TAKATA Kenta NAKAMURA Ryoichi INANAMI Hiroaki HAYASHI Katsumi KISHIMOTO Tetsuya HASEBE Yukihiro KAWANO Yusuke MATSUNAGA Kazuaki MURAKAMI Katsuya OKUMURA Publication IEICE TRANSACTIONS on Electronics Vol.E89-C No.3 pp.377-383 Publication Date: 2006/03/01 Online ISSN: 1745-1353 DOI: 10.1093/ietele/e89-c.3.377 Print ISSN: 0916-8516 Type of Manuscript: Special Section PAPER (Special Section on VLSI Design Technology in the Sub-100 nm Era) Category: CAD Keyword: cell library, character projection, electron beam, EB shots, throughput, optimization, integer linear programming, Full Text: PDF(427.7KB)>>
Summary: We propose a cell library development methodology for throughput enhancement of character projection equipment. First, an ILP (Integer Linear Programming)-based cell selection is proposed for the equipment for which both of the CP (Character Projection) and VSB (Variable Shaped Beam) methods are available, in order to minimize the number of electron beam (EB) shots, that is, time to fabricate chips. Secondly, the influence of cell directions on area and delay time of chips is examined. The examination helps to reduce the number of EB shots with a little deterioration of area and delay time because unnecessary directions of cells can be removed. Finally, a case study is shown in which the numbers of EB shots are shown for several cases. | |||||
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