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Theory of optimal pulse shaping for plasma processing | IEEE Conference Publication | IEEE Xplore

Theory of optimal pulse shaping for plasma processing


Abstract:

Thin film etching and deposition using low pressure plasma reactors is an integral part of the fabrication of VLSI circuits. This paper discusses the numerical calculatio...Show More

Abstract:

Thin film etching and deposition using low pressure plasma reactors is an integral part of the fabrication of VLSI circuits. This paper discusses the numerical calculation of periodic inputs to achieve desired operating conditions in low pressure plasma reactors. A gradient method is used to optimize the average value of state variables.
Date of Conference: 08-10 May 2002
Date Added to IEEE Xplore: 07 November 2002
Print ISBN:0-7803-7298-0
Print ISSN: 0743-1619
Conference Location: Anchorage, AK, USA

References

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