Reluctance actuators (RA) can replace the current Lorentz actuators in the next generation of positioning and scanning motion systems, such as the wafer stage in lithography machines. However, the nonlinear output force characteristic and the gap dependency of the RA are the main challenges in using the RA to drive motion systems. In this paper, we design a two-loop control approach for a reluctance actuator motion system (RAMS) to achieve tracking performance for a desired motion profile. First, the current control loop linearizes the RA under different conditions. Next, the position control loop is designed using a PID control based on an extended-high gain observer to achieve a desired motion profile considering unknown dynamics in the system. The simulation results show the efficiency of the proposed current control in linearizing the dynamic behavior under different desired forces and nominal air gaps and achieving a frequency response similar to the spring-mass-damper system. Moreover, the position control can achieve different long-stroke and short-stroke motion profiles with different amplitudes and ranges of motion.