Abstract:
This session of exclusively invited papers covers a selection of key developments extending CMOS scaling as well as several non-CMOS technologies with pervasive applicati...Show MoreMetadata
Abstract:
This session of exclusively invited papers covers a selection of key developments extending CMOS scaling as well as several non-CMOS technologies with pervasive applications. Included are an overview of lithography options beyond 45nm, high-K/metal-gate technology, high-speed BiCMOS, and opportunities orthogonal to conventional scaling.
Published in: 2008 IEEE Custom Integrated Circuits Conference
Date of Conference: 21-24 September 2008
Date Added to IEEE Xplore: 17 November 2008
ISBN Information: