Abstract:
In this work we present a double modified internal gate (MIG) pixel structure, fabricated in a slightly modified 0.35 mum CMOS process, to be effectively used in, e.g. lo...Show MoreMetadata
Abstract:
In this work we present a double modified internal gate (MIG) pixel structure, fabricated in a slightly modified 0.35 mum CMOS process, to be effectively used in, e.g. low-level irradiance fluorescent imaging applications. The pixel structure enables a non-destructive readout, which facilitates a constant monitoring of the molecule fluorescence process. The readout is based on signal averaging and up-the-ramp sampling current differential readout, which drastically reduces the amount of noise in the pixel output signal. The modified internal gates enable extremely low dark-current and very low-noise operation.
Published in: 2009 European Conference on Circuit Theory and Design
Date of Conference: 23-27 August 2009
Date Added to IEEE Xplore: 02 October 2009
CD:978-1-4244-3896-9