Abstract:
This paper describes the use of 800nm femtosecond infrared (IR) and 248nm nanosecond ultraviolet (UV) laser radiation in performing ablative micromachining of parylene-C ...Show MoreMetadata
Abstract:
This paper describes the use of 800nm femtosecond infrared (IR) and 248nm nanosecond ultraviolet (UV) laser radiation in performing ablative micromachining of parylene-C on SiO2 substrates for the patterning of human hNT astrocytes. Results are presented that support the validity of using IR laser ablative micromachining for patterning human hNT astrocytes cells while UV laser radiation produces photo-oxidation of the parylene-C and destroys cell patterning. The findings demonstrate how IR laser ablative micromachining of parylene-C on SiO2 substrates can offer a low cost, accessible alternative for rapid prototyping, high yield cell patterning.
Published in: 2013 35th Annual International Conference of the IEEE Engineering in Medicine and Biology Society (EMBC)
Date of Conference: 03-07 July 2013
Date Added to IEEE Xplore: 26 September 2013
Electronic ISBN:978-1-4577-0216-7
ISSN Information:
PubMed ID: 24109824
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