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Fabrication and electrochemical comparison of SIROF-AIROF-EIROF microelectrodes for neural interfaces | IEEE Conference Publication | IEEE Xplore

Fabrication and electrochemical comparison of SIROF-AIROF-EIROF microelectrodes for neural interfaces


Abstract:

Iridium oxide has been widely used in neural recording and stimulation due to its good stability and large charge storage capacity (CSC). In general, the iridium oxide fi...Show More

Abstract:

Iridium oxide has been widely used in neural recording and stimulation due to its good stability and large charge storage capacity (CSC). In general, the iridium oxide film used in the electrophysiological application can be grouped into three principal classifications: sputtering iridium oxide film (SIROF), activated iridium oxide film (AIROF) and electrodeposited iridium oxide film (EIROF). Although these kinds of iridium oxide all can remarkably reduce the impedance and increase the CSC of the microelectrode, they also exhibit markedly differences in electrochemical performances. After activation, the CSC of EIROF is 68.20 mC/cm2, which is 88.7 % larger than that of the SIROF and 67.6 % larger than that of the AIROF. The impedance at 1 kHz of the three kinds of iridium oxide microelectrode is around 4000 ohm, it is acceptable for the neural interface application. The phase at 1 kHz of the AIROF microelectrode is the largest which is -6.1 degree, about 22.6 % of the SIROF and 44.5 % of the EIROF.
Date of Conference: 26-30 August 2014
Date Added to IEEE Xplore: 06 November 2014
Electronic ISBN:978-1-4244-7929-0

ISSN Information:

PubMed ID: 25570000
Conference Location: Chicago, IL, USA

References

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