Abstract:
A new approach for including quasi-ballistic effects into TCAD drift diffusion simulations of short-channel III–V MOSFETs at low longitudinal fields is presented. The mod...Show MoreMetadata
Abstract:
A new approach for including quasi-ballistic effects into TCAD drift diffusion simulations of short-channel III–V MOSFETs at low longitudinal fields is presented. The model is based on the concept of ballistic mobility through a modified Matthiessen rule. It has been applied to double-gate thin-body InGaAs MOSFETs and benchmarked against multi-subband Monte Carlo simulations. Our results indicate that the model provides I–V characteristics in good agreement with Monte Carlo for channel lengths as short as 15 nm.
Date of Conference: 12-15 September 2016
Date Added to IEEE Xplore: 20 October 2016
ISBN Information:
Electronic ISSN: 2378-6558