Ultraviolet step-index silica single mode fiber as a spatial filter for interference lithography | IEEE Conference Publication | IEEE Xplore

Ultraviolet step-index silica single mode fiber as a spatial filter for interference lithography


Abstract:

We present the use of single mode optical fiber (SMF) as an effective and superior spatial filter as a source for an expanded ultraviolet beam used in interference lithog...Show More

Abstract:

We present the use of single mode optical fiber (SMF) as an effective and superior spatial filter as a source for an expanded ultraviolet beam used in interference lithography (IL). IL is used to produce nanopatterned structures with a period of 220nm in photoresist on samples over areas of many square centimeters. The SMF further acts as a flexible laser beam transport system replacing relay mirrors. Finally we demonstrate that with normal SMF (not polarization maintaining) it is still possible to preserve linear polarization over 60cm length of fiber with a purity of 100∶1. The output UV beam is shown to fit the far-field intensity pattern of a single LP01 with a numerical aperture of 0.09.
Date of Conference: 06-09 July 2013
Date Added to IEEE Xplore: 07 October 2013
ISBN Information:
Conference Location: Hsinchu, Taiwan

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