In this work, a comprehensive evaluation was performed for negative capacitance FinFET (NC-FinFET) based static random access memory (NC-SRAM) using the calibrated current-voltage relationship and dynamic behavior of NC-FinFETs that were experimentally demonstrated at 14-nm technology node. Important performance indicators of SRAM including static noise margin and standby leakage power were assessed at different values of supply voltage (V_DD). Compared with the conventional FinFET-based SRAM, it was found that NC-SRAM shows different behaviors at high V_DD and low V_DD. For example, at low V_DD, standby leakage power consumption of NC-SRAM is higher than conventional SRAM which is different from the conclusion drew by previous works when only high V_DD case was considered. Our evaluation gives new insights on the design of future NC-FinFET-based SRAMs, particularly with extremely low supply voltage.