Loading [a11y]/accessibility-menu.js
Pulsed laser deposition (PLD) of hafnium oxide thin films | IEEE Conference Publication | IEEE Xplore

Pulsed laser deposition (PLD) of hafnium oxide thin films


Abstract:

This work contains the experimental investigation of optical properties of HfO2 (hafnium oxide) thin films grown on quartz and n-type silica substrates by pulsed laser de...Show More

Abstract:

This work contains the experimental investigation of optical properties of HfO2 (hafnium oxide) thin films grown on quartz and n-type silica substrates by pulsed laser deposition method. Cold pressed powders of hafnium oxide (HfO2 98% - Aldrich Chem. Co.) were used as the target for deposition process. The substrates was heated up to temperature in the range between 200 and 500 °C. Optical properties of the films were investigated by transmittance in the ultra-violet, visible and near infrared range and photoluminescence spectroscopy. We measure the photo-luminescence spectra and dynamics of luminescence process. Optical properties are closely related to the structure of the hafnium oxide thin films.
Date of Conference: 06-10 July 2014
Date Added to IEEE Xplore: 14 August 2014
Electronic ISBN:978-1-4799-5601-2

ISSN Information:

Conference Location: Graz, Austria

References

References is not available for this document.