Modern technologies requires thin films for different applications. Thin film materials are important elements of technological progress made in the fields of optoelectronic, photonic, photovoltaic and magnetic devices. The processing of materials into thin films allows easy integration into various types of devices. The properties of material significantly differ when studied in the form of thin films. Technologies of the thin films makes use of the fact that the properties can be easy controlled by the thickness of the layer. Thin films are formed mostly by deposition with physical or chemical methods. Obtained layers, both crystalline and amorphous, are important for the modern technology. In this paper, we present the selected methods of thin films depositions (Pulsed Laser Deposition, Physical Vapour Deposition, Dip coating and spin coating) and examples of their application. All of these methods are implemented in the Laboratory of Physical Foundations of Microelectronics, Institute of Physics, Nicolaus Copernicus University [1-6].