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Advanced double-sampling architectures | IEEE Conference Publication | IEEE Xplore

Advanced double-sampling architectures


Abstract:

Aggressive technology scaling has dramatic impact on process, voltage and temperature (PVT) variations; circuit aging and wearout; clock skews; sensitivity to EMI (e.g. c...Show More

Abstract:

Aggressive technology scaling has dramatic impact on process, voltage and temperature (PVT) variations; circuit aging and wearout; clock skews; sensitivity to EMI (e.g. crosstalk and ground bounce), sensitivity to radiation-induced SEUs SETs; as well as power dissipation and thermal constraints. The resulting high defect rates and design complexity, adversely affect fabrication yield and reliability.
Date of Conference: 04-06 July 2016
Date Added to IEEE Xplore: 24 October 2016
ISBN Information:
Electronic ISSN: 1942-9401
Conference Location: Sant Feliu de Guixols, Spain

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