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New Insights into the Imprint Effect in FE-HfO2 and its Recovery | IEEE Conference Publication | IEEE Xplore

New Insights into the Imprint Effect in FE-HfO2 and its Recovery


Abstract:

The mechanism of imprint in FE-HfO2 is investigated in detail. It is clearly shown that the imprint can be recovered by additional pulses and domain switching is indispen...Show More

Abstract:

The mechanism of imprint in FE-HfO2 is investigated in detail. It is clearly shown that the imprint can be recovered by additional pulses and domain switching is indispensable for the recovery. The results from sub-loop measurement suggest that the imprint of each domain can be considered to be independent. Switching time measurements reveal that the imprint is well described by the nucleation limited switching kinetic model. In addition, a clear correlation between imprint and gate leakage current is successfully demonstrated. Based on these results, a model for imprint is proposed.
Date of Conference: 31 March 2019 - 04 April 2019
Date Added to IEEE Xplore: 23 May 2019
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Conference Location: Monterey, CA, USA

References

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