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Investigation on VTH and RON Slow/Fast Drifts in SiC MOSFETs | IEEE Conference Publication | IEEE Xplore

Investigation on VTH and RON Slow/Fast Drifts in SiC MOSFETs


Abstract:

RON and VTH drifts in TO-247 SiC packaged MOSFETs are investigated in this paper. The use of a novel on-the-fly measurement setup able to capture their variation over a 1...Show More

Abstract:

RON and VTH drifts in TO-247 SiC packaged MOSFETs are investigated in this paper. The use of a novel on-the-fly measurement setup able to capture their variation over a 100μs to 1000s time range revealed the presence of two separated fast and slow mechanisms affecting the VTH and RON stability. Particularly, fast drain-induced mechanisms were found to negatively shift VTH, whereas no appreciable fast drifts were observed on RON. Conversely, slow drifts were found on both parameters, yielding a decrease in VTH and an RON increase. To investigate their origin, measurements were carried out for either i) different Duty Cycles and ii) several on-state current levels, proving that device self-heating (i.e., temperature increase) is responsible for the observed slow instabilities.
Date of Conference: 21-25 March 2021
Date Added to IEEE Xplore: 26 April 2021
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Conference Location: Monterey, CA, USA

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