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Resistive FET IQ vector modulator using multilayer photoimageable thick-film technology | IEEE Conference Publication | IEEE Xplore

Resistive FET IQ vector modulator using multilayer photoimageable thick-film technology


Abstract:

A novel C-band IQ vector modulator is presented in this paper. The circuit uses two GaAs MMIC FET quads operating in resistive mode. The balanced configuration of each re...Show More

Abstract:

A novel C-band IQ vector modulator is presented in this paper. The circuit uses two GaAs MMIC FET quads operating in resistive mode. The balanced configuration of each resistive FET bi-phase modulator provides high linearity and isolation. The vector modulator substrate, incorporating the multilayer baluns, 90 degree coupler and in-phase power combiner, measures 25.4mm /spl times/ 25.4mm and is fabricated using photoimageable thick-film processing technique. This modified thick-film process is capable of implementing 3D Multi-Chip Modules (MCM-C), a promising technology for low-cost solutions for microwave components.
Date of Conference: 25-28 May 2003
Date Added to IEEE Xplore: 20 June 2003
Print ISBN:0-7803-7761-3
Conference Location: Bangkok, Thailand

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