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Measurement of delay mismatch due to process variations by means of modified ring oscillators | IEEE Conference Publication | IEEE Xplore

Measurement of delay mismatch due to process variations by means of modified ring oscillators


Abstract:

A novel and effective test circuit to measure cell-to-cell delay mismatch due to process variations is presented. A fully digital control circuit that efficiently realize...Show More

Abstract:

A novel and effective test circuit to measure cell-to-cell delay mismatch due to process variations is presented. A fully digital control circuit that efficiently realizes the technique is also described. The proposed test structure is realized by a series of modified ring oscillators that minimize factors of inaccuracy. The results of a simulation using 0.18 /spl mu/m CMOS technology show the feasibility of the technique. This test structure can be beneficial in thoroughly characterizing the effects of systematical process variations inside the chip.
Date of Conference: 23-26 May 2005
Date Added to IEEE Xplore: 25 July 2005
Print ISBN:0-7803-8834-8

ISSN Information:

Conference Location: Kobe, Japan

References

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