The 4th Generation Intel® Core™ processor, codenamed Haswell, is a family of products implemented on Intel 22nm Tri-gate process technology [1]. The primary goals for the Haswell program are platform integration and low power to enable smaller form factors. Haswell incorporates several building blocks, including: platform controller hubs (PCHs), memory, CPU, graphics and media processing engines, thus creating a portfolio of product segments from fan-less Ultrabooks™ to high-performance desktop, as shown in Fig. 5.9.1. It also integrates a number of new technologies: a fully integrated voltage regulator (VR) consolidating 5 platform VRs down to 1, on-die eDRAM cache for improved graphics performance, lower-power states, optimized IO interfaces, an Intel AVX2 instruction set that supports floating-point multiply-add (FMA), and 256b SIMD integer achieving 2× the number of floating-point and integer operations over its predecessor. The 22nm process is optimized for Haswell and includes 11 metal layers (2 additional metal layers vs. Ivy Bridge [2]), high-density metal-insulator-metal (MIM) capacitors, and is tuned for different leakage/speed targets based on the market segment. For example, in some low-power products, the process is optimized to reduce leakage by 75% at V_min, while paying only 12% intrinsic device degradation at the high-voltage corner.