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Influence of target-target distance for composition distribution in new facing targets sputtering | IEEE Conference Publication | IEEE Xplore

Influence of target-target distance for composition distribution in new facing targets sputtering


Abstract:

Combinatorial New-Facing Targets Sputtering (combi-NFTS) is one of the co-sputtering method applied to the combinatorial method. Combi-NFTS could easily control the compo...Show More

Abstract:

Combinatorial New-Facing Targets Sputtering (combi-NFTS) is one of the co-sputtering method applied to the combinatorial method. Combi-NFTS could easily control the composition range by changing the distance from substrate to targets. Furthermore composition gradient is relatively linear comparing to other thin film deposition method. In this paper, the influence of the distance between target and target gives for the composition distribution is investigated. As a result, it was elucidated that composition distribution and gradient increase as the TT distance increase. This is caused by the peak position of amount of deposited sputtering atom on the substrate change by the TT distance.
Date of Conference: 10-12 November 2014
Date Added to IEEE Xplore: 12 January 2015
ISBN Information:
Conference Location: Nagoya, Japan

References

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