This work describes using a rigiflex polyurethane acrylate (PUA) mold for the contact-transferred and mask embedded lithography (CMEL), and therefore provides a new approach in nano-fabrication. Based on this fabrication process, metallic linear-grating patterns are successfully embedded into a polymer substrate with the following two cases: (1) line-width of 65 nm, period of 130 nm, area size of 2×2.5 cm²; (2) line-width of 60 nm, period of 180 nm, area size of 5×5 cm². These metallic nano-wired polymer substrates can be used as flexible polarizer and their optical performances have been characterized. Advantages and potential application of this nano-fabrication method will be addressed.