Abstract:
This paper presents an innovative technique of integrating silica nanowires to photoresist-derived carbon microelectromechanical systems (C-MEMS) on silicon substrate. Th...Show MoreMetadata
Abstract:
This paper presents an innovative technique of integrating silica nanowires to photoresist-derived carbon microelectromechanical systems (C-MEMS) on silicon substrate. The silica nanowires were synthesized through thermal treatment in a tube furnace at 1200 °C under a gaseous environment of N2 and H2. The stiff morphology and radicalized distribution around carbon posts of nanowires was observed, which was different from much of the previous studies. High-temperature annealing and meticulous-controlled pyrolying atmosphere could be the causes of the formation of unusual SiO2/C-MEMS integrated structures.
Published in: The 8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems
Date of Conference: 07-10 April 2013
Date Added to IEEE Xplore: 18 July 2013
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