Abstract:
We develop a direct and all-dry microfabrication method of ultramicroelectrode based on cold atmospheric microplasma jet. The microfabrication process includes micropipet...Show MoreMetadata
Abstract:
We develop a direct and all-dry microfabrication method of ultramicroelectrode based on cold atmospheric microplasma jet. The microfabrication process includes micropipette preparation, metal sputtering, chemical vapor deposition of parylene-C layer and microplasma jet micromachining (Fig. 1). The generated microplasma jet can effectively remove the polymer layer on the tip. The exposed metal part can be used as ultramicroelectrode point or further modified with electrochemical deposition and other methods. The exposed area can be controlled by the treatment time and the average etching rate is approximately 1.1 \mu\mathrm{m}/\mathrm{s}. Due to the properties of cold atmospheric microplasma jet, the microfabrication can be realized without high-precision machining and vacuum equipment.
Published in: 2021 IEEE 16th International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)
Date of Conference: 25-29 April 2021
Date Added to IEEE Xplore: 21 June 2021
ISBN Information: