Evaluation of layout design styles using a quality design metric | IEEE Conference Publication | IEEE Xplore

Evaluation of layout design styles using a quality design metric


Abstract:

Leading-edge chip makers are moving towards more regular litho-friendly design styles in order to combat litho-induced process variations. This paper explores layout desi...Show More

Abstract:

Leading-edge chip makers are moving towards more regular litho-friendly design styles in order to combat litho-induced process variations. This paper explores layout design providing several layout templates and we propose a fast and simple design metric to evaluate the potential benefits and weaknesses of a given template. We show that a regular cell template can achieve similar overall qualification compared to a traditional 2D standard cell design.
Date of Conference: 12-14 September 2012
Date Added to IEEE Xplore: 31 December 2012
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Conference Location: Niagara Falls, NY, USA

References

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