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Sub-Threshold Delay and Power Analysis of Complementary Metal-Oxide Semiconductor Buffer Driven Interconnect Load for Ultra Low Power Applications

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In this paper, analytical models for timing analysis of a complementary metal-oxide semiconductor buffer driven resistance-inductance-capacitance interconnect load in sub-threshold regime of operation have been proposed. Closed form expressions are given for estimating the output voltage and propagation delay. Analytical model is also provided for resistive current and power estimation. It is shown that operating transistor in the sub-threshold region leads to an order of saving in power dissipation in comparison to normal strong inversion. Therefore, sub-threshold regime is highly suitable for ultra low power circuit design. The analysis has been carried out for three technology nodes viz. 130 nm, 90 nm and 65 nm. The results are verified using SPICE simulations. A good agreement is found between the analytical and the simulation results.

Keywords: BUFFER; COMPLEMENTARY METAL-OXIDE SEMICONDUCTOR (CMOS); RLC INTERCONNECTS; SUB-THRESHOLD; ULTRA LOW POWER DISSIPATION; VERY LARGE SCALE INTEGRATION (VLSI)

Document Type: Research Article

Publication date: 01 February 2012

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  • The electronic systems that can operate with very low power are of great technological interest. The growing research activity in the field of low power electronics requires a forum for rapid dissemination of important results: Journal of Low Power Electronics (JOLPE) is that international forum which offers scientists and engineers timely, peer-reviewed research in this field.
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