To prepare antireflection coating (ARC) by wet process is important technology for low cost fabrication of solar cells. In this research, we consider the optical reflectance of a three layer stack structure of ARC films on the pyramidally textured single-crystalline silicon substrates. Each layer of the ARC films is deposited by a spin-coating method. The triple layers consist of SiO₂, SiO₂-TiO₂ mixture, and TiO₂ films from air to the silicon substrate in that order, and the refractive index is slightly increased from air to the substrate. Light reflection can be reduced further mainly due to graded index effect. The optimized three layer structure ARC shows that the reflectance is below 0.048 at the wavelength of 600 nm.