Effect of Impurity in Discharge Gas on High γ Properties of Newly Developed CeSrO Film for Novel Plasma Display Panel

Yasuhiro YAMAUCHI; Yusuke FUKUI; Yosuke HONDA; Michiko OKAFUJI; Masahiro SAKAI; Mikihiko NISHITANI; Yasushi YAMAUCHI

doi:10.1587/transele.E95.C.1761

Special Section on Electronic Displays

Effect of Impurity in Discharge Gas on High γ Properties of Newly Developed CeSrO Film for Novel Plasma Display Panel

Yasuhiro YAMAUCHI, Yusuke FUKUI, Yosuke HONDA, Michiko OKAFUJI, Masahiro SAKAI, Mikihiko NISHITANI, Yasushi YAMAUCHI

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Keywords: PDP, γ, protective layer, discharge, MgO

JOURNAL RESTRICTED ACCESS

2012 Volume E95.C Issue 11 Pages 1761-1768

DOI https://doi.org/10.1587/transele.E95.C.1761

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Abstract

The discharge properties and chemical surface stability of CeO₂ containing Sr (CeSrO) as the candidate for high-γ protective layer of noble plasma display panels (PDPs) are characterized. CeSrO films have superior chemical stability, because of the decrease in reactiveness on surface due to their fluorite structure. The discharge voltage is 50V lower than that of MgO films for a pure discharge gas of Ne/Xe =85/15 at 60kPa. However the topmost surface, monolayer, of the CeSrO film relevant to the discharge property is hardly recovered from the damage by CO₂ impurity in discharge gas. We can expect that by pumping down to a sufficiently low CO₂ partial pressure (lower than 1×10^-3Pa), PDP panels with very high efficiency are realized with CeSrO protective layer.

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