IEICE Transactions on Electronics
Online ISSN : 1745-1353
Print ISSN : 0916-8524
Special Section on Opto-electronics and Communications for Future Optical Network
Study on Analysis and Fabrication Conditions of Horizontal SiO2 Slot Waveguides Using Nb2O5
Yoshiki HAYAMAKatsumi NAKATSUHARAShinta UCHIBORITakeshi NISHIZAWA
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2020 Volume E103.C Issue 11 Pages 669-678

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Abstract

Horizontal slot waveguides enable light to be strongly confined in thin regions. The strong confinement of light in the slot region offers the advantages of enhancing the interaction of light with matter and providing highly sensitive sensing devices. We theoretically investigated fundamental characteristics of horizontal slot waveguides using Nb2O5. The coupling coefficient between SiO2 slot and air slot waveguides was calculated. Characteristics of bending loss in slot waveguide were also analyzed. The etching conditions in reactive ion etching needed to obtain a sidewall with high verticality were studied. We propose a process for fabricating horizontal slot waveguides using Nb2O5 thin film deposition and selective etching of SiO2. Horizontal slot waveguides were fabricated that had an SiO2 slot of less than 30 nm SiO2. The propagated light passing through the slot waveguides was also obtained.

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© 2020 The Institute of Electronics, Information and Communication Engineers
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