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Resistance of Cell in Fractal Growth in Electrodeposition

Resistance of Cell in Fractal Growth in Electrodeposition

Y. H. Shaikh, A. R. Khan, K. B. Patange, J. M. Pathan, S. H. Behere
Copyright: © 2011 |Volume: 2 |Issue: 1 |Pages: 11
ISSN: 1947-3087|EISSN: 1947-3079|EISBN13: 9781613505731|DOI: 10.4018/jalr.2011010102
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MLA

Shaikh, Y. H., et al. "Resistance of Cell in Fractal Growth in Electrodeposition." IJALR vol.2, no.1 2011: pp.17-27. http://doi.org/10.4018/jalr.2011010102

APA

Shaikh, Y. H., Khan, A. R., Patange, K. B., Pathan, J. M., & Behere, S. H. (2011). Resistance of Cell in Fractal Growth in Electrodeposition. International Journal of Artificial Life Research (IJALR), 2(1), 17-27. http://doi.org/10.4018/jalr.2011010102

Chicago

Shaikh, Y. H., et al. "Resistance of Cell in Fractal Growth in Electrodeposition," International Journal of Artificial Life Research (IJALR) 2, no.1: 17-27. http://doi.org/10.4018/jalr.2011010102

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Abstract

This paper presents the study of dynamic electrical resistance of the electrodeposition cell during the growth metallic dendrites showing fractal character. The electric resistance of the circular electrodeposition cell is measured in real time using a computer based data acquisition system. The data acquisition system constructed is capable of measuring the cell voltage and the current through the cell under program control at pre-decided intervals. This allows for the measurement of the dynamic electrical resistance of the electrodeposition cell. The system is based on standard analogue to digital controller ADC interfaced to the computer through the printer port.

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