Abstract
Numerical scheme, grid generation and parallelization algorithm are presented for numerical simulation of complex process of silicon-based films growth in plasma enhanced chemical vapor deposition reactors. MPI-based computing environment and advanced interactive software with graphic user interface, real-time visualization system and Web access were recently developed to provide distributed parallel multitask calculation and visualization on Linux clusters. Analysis of system performance and cluster load balance showed the bottlenecks of parallel implementation and the ways of algorithms improvement.
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Keywords
- Plasma Enhance Chemical Vapor Deposition
- Grid Generation
- Remote User
- Chemical Vapor Deposition Reactor
- Parallelization Algorithm
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Gorbachev, Y.E. et al. (2001). Distributed Simulation of Amorphous Hydrogenated Silicon Films: Numerical Experiments on a Linux Based Computing Environment. In: Alexandrov, V.N., Dongarra, J.J., Juliano, B.A., Renner, R.S., Tan, C.J.K. (eds) Computational Science — ICCS 2001. ICCS 2001. Lecture Notes in Computer Science, vol 2073. Springer, Berlin, Heidelberg. https://doi.org/10.1007/3-540-45545-0_57
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DOI: https://doi.org/10.1007/3-540-45545-0_57
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