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Layout Decomposition for Multiple Patterning

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Recommended Reading

  1. Kahng AB, Xu X, Park C-H, Yao H (2008) Layout decomposition for double patterning lithography. In: IEEE/ACM international conference on computer-aided design, San Jose

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  2. Yuan K, Yang J-S, Pan DZ (2010) Double patterning layout decomposition for simultaneous conflict and stitch minimization. IEEE Trans Comput-Aided Des Integr Circuits Syst 29:185–196

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  3. Yu B, Yuan K, Zhang B, Ding D, Pan DZ (2011) Layout decomposition for triple patterning lithography. In: IEEE/ACM international conference on computer-aided design, San Jose

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  4. Tian H, Zhang H, Ma Q, Xiao Z, Wong MDF (2012) A polynomial time triple patterning algorithm for cell based row-structure layout. In: IEEE/ACM international conference on computer-aided design, San Jose

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  5. Fang S-Y, Chang Y-W, Chen W-Y (2012) A novel layout decomposition algorithm for triple patterning lithography. In: IEEE/ACM proceedings of design automation conference, San Francisco

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  6. Kuang J, Yang EFY (2013) An efficient layout decomposition approach for triple patterning lithography. In: IEEE/ACM proceedings of design automation conference, Austin

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  7. Zhang Y, Luk W-S, Zhou H, Yan C, Zeng X (2013) Layout decomposition with pairwise coloring for multiple patterning lithography. In: IEEE/ACM international conference on computer-aided design, San Jose

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  8. Yu B, Lin Y-H, Luk-Pat G, Ding D, Lucas K, Pan DZ (2013) A high-performance triple patterning layout decomposer with balanced density. In: IEEE/ACM international conference on computer-aided design, San Jose

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  9. Tian H, Zhang H, Du Y, Xiao Z, Wong MDF (2013) Constrained pattern assignment for standard cell based triple patterning lithography. In: IEEE/ACM international conference on computer-aided design, San Jose

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Correspondence to Haitong Tian .

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© 2016 Springer Science+Business Media New York

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Tian, H., Wong, M.D.F. (2016). Layout Decomposition for Multiple Patterning. In: Kao, MY. (eds) Encyclopedia of Algorithms. Springer, New York, NY. https://doi.org/10.1007/978-1-4939-2864-4_745

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