Skip to main content

Surface Roughening in Homoepitaxial Growth: A Lattice Gas Cellular Automaton Model

  • Conference paper
Cellular Automata (ACRI 2004)

Part of the book series: Lecture Notes in Computer Science ((LNCS,volume 3305))

Included in the following conference series:

Abstract

We study the structural evolution of a growing thin film on time scales in the order of seconds and even minutes. This requires solving the problem of bridging large time and length scale gaps in simulating atomistic processes during thin film deposition. We describe a new simulation approach inspired by lattice gas cellular automata to address this problem. The approach is based on a discrete description of atoms so that the unit length scale coincides with the atomic diameter. For homoepitaxial thin film deposition, the local driving force is the propensity of an atom to establish as many chemical bonds as possible to the underlying substrate atoms when it executes surface diffusion. The interaction between atoms is defined using a coarse-grained approach to boost the computation speed without heavily sacrificing the atomistic details. Simulation results of Si layers deposited on a Si(001) substrate are presented.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 84.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 109.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. Jacobson, J., Cooper, B.H., Sethna, J.P.: Simulations of energetic beam deposition: From picoseconds to seconds. Phys. Rev. B 58, 15847–15865 (1998)

    Article  Google Scholar 

  2. Boon, J.P., Dab, D., Kapral, R., Lawniczak, A.: Lattice gas automata for reactive systems. Physics Reports 273, 55–147 (1996)

    Article  MathSciNet  Google Scholar 

  3. Marsaglia, G., Narasimhan, B., Zaman, A.: A random number generator for PC’s. Comp. Phys. Comm. 60, 345–349 (1990)

    Article  MATH  MathSciNet  Google Scholar 

  4. Marsaglia, G., Zaman, A., Tsang, W.: Toward a universal random number generator. Statistics & Probability Letters 9, 35–39 (1990)

    Article  MATH  MathSciNet  Google Scholar 

  5. Gerisch, A., Lawniczak, A.T., Budiman, R.A., Ruda, H.E., Fukś, H.: Lattice gas cellular automaton modeling of surface roughening in homoepitaxial growth in nanowires. In: IEEE CCECE 2003-CCGEI 2003, Montréal, Quebec, Canada, May/mai 2003, pp. 001–004 (2003)

    Google Scholar 

  6. Milman, V., Jesson, D.E., Pennycook, S.J., Payne, M.C., Lee, M.H., Stich, I.: Largescale ab initio study of the binding and diffusion of a Ge adatom on the Si(100) surface. Phys. Rev. B 50, 2663–2666 (1994)

    Article  Google Scholar 

  7. Kittel, C.: Introduction to Solid State Physics. Wiley, New York (1996)

    Google Scholar 

  8. Pimpinelli, A., Villain, J.: Physics of Crystal Growth. CUP, Cambridge (1998)

    Book  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 2004 Springer-Verlag Berlin Heidelberg

About this paper

Cite this paper

Gerisch, A., Lawniczak, A.T., Budiman, R.A., Fukś, H., Ruda, H.E. (2004). Surface Roughening in Homoepitaxial Growth: A Lattice Gas Cellular Automaton Model. In: Sloot, P.M.A., Chopard, B., Hoekstra, A.G. (eds) Cellular Automata. ACRI 2004. Lecture Notes in Computer Science, vol 3305. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-30479-1_30

Download citation

  • DOI: https://doi.org/10.1007/978-3-540-30479-1_30

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-540-23596-5

  • Online ISBN: 978-3-540-30479-1

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics