Skip to main content

Indium Tin Oxide (ITO): Sputter Deposition Processes

  • Reference work entry
Handbook of Visual Display Technology

Abstract

ITO (or tin-doped indium-oxide) coatings have excellent electrical conductivity and optical transparency and are therefore used as transparent electrodes in most display products. Such coatings can be deposited either in a purely reactive sputter process from metallic In-Sn alloy targets or from ceramic ITO targets using a quasi-reactive process. The latter technology implemented as DC magnetron sputtering prevails today in the industry. The formation of nodules on the target surface during the sputtering process over time is associated with the fact that indium-oxide exists in three allotropic phases. Such nodules are a source of process instability and of coating pinholes. The usage of rotary cathodes is a way to eliminate or at least strongly reduce this problem. Such cathodes also give rise to considerably reduced coating costs, as will be illustrated with applications taken from the LCD and touch panel industries.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 899.99
Price excludes VAT (USA)
  • Available as EPUB and PDF
  • Read on any device
  • Instant download
  • Own it forever

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Abbreviations

AM-LCD:

Active Matrix Liquid Crystal Display

CF:

Color Filter

CSTN:

Color Super-Twisted Nematic

DC:

Direct Current

DDR:

Dynamic Deposition Rate (Normally in nm.m/min)

EMI:

Electromagnetic Interference

ITO:

Indium-Tin-Oxide (or Tin-Doped Indium-Oxide)

LCD:

Liquid Crystal Display

MF-AC:

Middle Frequency Alternating Current (Typic. 10–200 kHz)

PDP:

Plasma Display Panel

PE-CVD:

Plasma-Enhanced Chemical Vapor Deposition

PEM:

Plasma Emission Monitor

PET:

Poly-Ethylene-Terephthalate

PM-LCD:

Passive Matrix Liquid Crystal Display

RF:

Radio Frequency (Typic. 13.56 MHz)

STN:

Super-twisted Nematic

TCO:

Transparent Conductive Oxide

TEC:

Transparent Electronic Conductor

TFT:

Thin Film Transistor

TN:

Twisted Nematic

TP:

Touch Panel

TU:

Target Utilization

UV:

Ultra Violet

References

  1. Haacke G (1976) New figure of merit for transparent conductors. J Appl Phys 47:4086–4088

    Article  Google Scholar 

  2. Minami T (2000) New n-type transparent conducting oxides. MRS Bulletin/Aug 2000, pp 38–44

    Google Scholar 

  3. Bright C (2008) Alternative transparent conductive oxides (TCO) to ITO. In: Proceedings of the 51st annual technical conference of the society of vacuum coaters (SVC), Chicago, April 19–24, 2008, pp 840–850

    Google Scholar 

  4. Schiller S et al (1994) The optical plasma emission – a useful tool to monitor and to control the reactive magnetron sputtering. In: Presentation at the conference on in-situ monitoring and diagnostics of plasma processes, November 18, 1994, Ghent, Belgium

    Google Scholar 

  5. Strümpfel J, May C (2000) Low ohm large area ITO coating by reactive magnetron sputtering in DC and MF-mode. Vacuum 59(2–3):500–505

    Article  Google Scholar 

  6. Lippens P et al (1998) Chemical instability of the target surface during DC-magnetron sputtering of ITO coatings. Thin Solid Films 317:405–408

    Article  Google Scholar 

  7. Nakashima K, Kumahara Y (2002) Effect of tin oxide dispersion on nodule formation in ITO sputtering. Vacuum 66:221–226

    Article  Google Scholar 

  8. Omata T et al (2006) Characterization of indium-tin oxide sputtering targets showing various densities of nodule formation. Thin Solid Films 503:22–28

    Article  Google Scholar 

  9. Reger N et al (1998) Sputtering effects during 3D-imaging of indium-tin-oxide sputtering targets. In: Gillen et al (eds) Secondary ion mass spectrometry, SIMS XI, Wiley, pp 855–858

    Google Scholar 

  10. Schlott M et al (1996) P-31: nodule formation on indium-oxide tin-oxide sputtering targets. SID96 DIGEST, Santa Ana

    Google Scholar 

  11. Stowell M et al (2007) RF-superimposed DC and pulsed DC sputtering for deposition of transparent conductive oxides. Thin Solid Films 515:7654–7657

    Article  Google Scholar 

  12. Boeuf JP (2003) Plasma display panels: physics, recent developments and key issues. J Phys D Appl Phys 36:R53–R79

    Article  Google Scholar 

  13. Nagao N et al (2002) Development of Ag fence electrode structure PDP without ITO. Proc Int Disp Workshops 9:765–768

    Google Scholar 

  14. Kukla R et al (2004) New modular roll-to-roll PVD web coater for clean room production. In: Proceedings of the 47th annual technical conference of the society of vacuum coaters (SVC), April 24–29, 2004, Dallas, pp 174–178

    Google Scholar 

  15. Lippens P, Verheyen P (1994) Electrochromic half-cells on organic substrate produced by subsequent deposition of ITO and WO3 in a roll coater using optical plasma emission monitoring. In: Proceedings of the 37th annual technical conference of the society of vacuum coaters (SVC), 1994, Boston, pp 254–259

    Google Scholar 

  16. US Patent 4,356,073, 26 Oct. 1982 of Shatterproof Glass Corp

    Google Scholar 

  17. Lippens P et al (2008) Thin film ITO coatings obtained using rotary sputtering targets. In: De Gryse R et al (eds) Proceedings of the international conference on thin films 14 (ICTF14 & RSD2008), Ghent, Belgium, pp 52–55

    Google Scholar 

Download references

Acknowledgments

Paul Lippens is the sole author of part 5.4.1.5.2 “ITO in TP (PET-FILM).”

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Paul Lippens .

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 2012 Springer-Verlag Berlin Heidelberg

About this entry

Cite this entry

Lippens, P., Muehlfeld, U. (2012). Indium Tin Oxide (ITO): Sputter Deposition Processes. In: Chen, J., Cranton, W., Fihn, M. (eds) Handbook of Visual Display Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-79567-4_54

Download citation

Publish with us

Policies and ethics