Abstract
We show, through an example in surface-plasmons assisted nano-lithography, the great influence of the definition of the objective function on the quality of the solutions obtained after optimization. We define the visibility and the contrast of a surface-plasmons interference pattern as possible objective functions that will serve to characterize the geometry of a nano-structure. We optimize them with an Elitist Evolution Strategy and compare, by means of some numerical experiments, their effects on the geometrical parameters found. The maximization of the contrast seems to provide solutions more stable than those obtained when the visibility is maximized. Also, it seems to avoid the lack-of-uniqueness problems resulting from the optimization of the visibility.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
Hodgson, R.J.W.: Genetic Algorithm Approach to Particle Identification by Light Scattering. Journal of Colloid and Interface Science 229, 399–406 (2000)
Prins, C., Prodhon, C., Soriano, P., Ruiz, A., Wolfler-Calvo, R.: Solving the Capacitated LRP by a Cooperative Lagrangean Relaxation-Granular Tabu Search Heuristic. Transportation Science 41, 470–483 (2007)
Macías, D., Olague, G., Méndez, E.R.: Inverse scattering with far-field intensity data: random surfaces that belong to a well-defined statistical class. Waves in Random and Complex Media 16, 545–560 (2006)
Kildishev, A.V., Chettiar, U.K., Liu, Z., Shalaev, V.M., Kwon, D., Bayraktar, Z., Werner, D.H.: Stochastic optimization of low-loss optical negative-index metamaterial. J. Opt. Soc. Am. B 24, A34–A39 (2007)
Macías, D., Vial, A.: Optimal design of plasmonic nanostructures for plasmon-interference assited lithography. Appl. Phys. B 93, 159–163 (2008)
Barchiesi, D., Macías, D., Belmar-Letellier, L., van Labeke, D., Lamy de la Chapelle, M., Toury, T., Kremer, E., Moreau, L., Grosges, T.: Plasmonics: influence of the intermediate (or stick) layer on the efficiency of sensors. Appl. Phys. B 93, 177–181 (2008)
Maier, S.A.: Plasmonics: Fundamentals and Applications, p. 223. Springer, Heidelberg (2007)
Homola, J.: Surface Plasmon Resonance Based Sensors, p. 251. Springer, Berlin (2006)
Derouard, M., Hazart, J., Lérondel, G., Bachelot, R., Adam, P.-M., Royer, P.: Polarization-sensitive printing of surface plasmon interferences. Optics Express 15, 4238–4246 (2007)
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2009 Springer-Verlag Berlin Heidelberg
About this paper
Cite this paper
Prodhon, C., Macías, D., Yalaoui, F., Vial, A., Amodeo, L. (2009). Evolutionary Optimization for Plasmon-Assisted Lithography. In: Giacobini, M., et al. Applications of Evolutionary Computing. EvoWorkshops 2009. Lecture Notes in Computer Science, vol 5484. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-01129-0_47
Download citation
DOI: https://doi.org/10.1007/978-3-642-01129-0_47
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-01128-3
Online ISBN: 978-3-642-01129-0
eBook Packages: Computer ScienceComputer Science (R0)