Abstract
In this study, the source region of a partially depleted PD SOI n-MOSFET has a high peak-to-valley ratio tunnel diode buried within it. In the MOSFET source region, intrinsic germanium is added at various micro-lengths. The result is compared with various embedded tunnel diode peak-to-valley ratios to determine the constant saturation drain current with a large voltage swing. Other phenomena that come from this device, such as low output resistance, capacitance, high voltage gain, and output signal distortion, were greatly reduced. The proposed device is one of the most promising candidates for low-power digital and analog circuits. This structure’s performance is evaluated using I–V characteristics for various voltages using the COGENDA device simulator.
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Ibrahim, S.J.A., Kumar, V.J., Chakravarthy, N.S.K., Mohideen, A.M.K., Deepika, M.M., Sathya, M. (2023). Performance Augmentation of DIMOS Transistor. In: Bhateja, V., Carroll, F., Tavares, J.M.R.S., Sengar, S.S., Peer, P. (eds) Intelligent Data Engineering and Analytics. FICTA 2023. Smart Innovation, Systems and Technologies, vol 371. Springer, Singapore. https://doi.org/10.1007/978-981-99-6706-3_51
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