Skip to main content
Log in

Analytical current model of tunneling field-effect transistor considering the impacts of both gate and drain voltages on tunneling

包含栅压和漏压共同影响的隧穿场效应晶体管的解析电流模型

  • Research Paper
  • Published:
Science China Information Sciences Aims and scope Submit manuscript

Abstract

In this paper, a closed-form current model for bulk tunneling field-effect transistor (TFET) is put forward. Based on the operation mechanism, the channel surface potential ϕ sf which involves the impact of both the gate and the drain voltages is established for the first time. In addition, a new calculation method for the dynamic tunneling width, which is the critical parameter for the TFET modeling, is derived from the surface potential. The surface-potential-based current model is established which is in a good agreement with TCAD simulation results.

摘要

本文提出了一个针对隧穿场晶体管(TFET)的电流模型。 首先, 本文首次建立了包含栅压和漏压对隧穿过程共同影响的沟道表面电势的解析表达式; 其次, 本文提出了隧穿宽度的计算方法; 最后, 本文提出的电流模型与TCAD仿真结果有着良好的吻合并可用于SPICE电路仿真。

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. Nirschl T, Wang P F, Weber C. The tunnelling field effect transistors (TFET): the temperature dependence, the simulation model, and its application. In: Proceedings of the 2004 International Symposium on Circuits and Systems, Vancouver, 2004. III–713-16

    Google Scholar 

  2. Zhan Z, Huang Q Q, Huang R, et al. A comb-gate silicon tunneling field effect transistor with improved on-state current. Sci China Inf Sci, 2013, 56: 072401

    Article  Google Scholar 

  3. Hong Y b, Yang Y, Yang L T, et al. SPICE behavioral model of the tunneling field-effect transistor for circuit simulation. IEEE Trans Circuit Syst II, 2009, 56: 946–950

    Article  Google Scholar 

  4. Verhulst S A, Soree B, Leonelli D, et al. Modeling the single-gate, double-gate, and gate-all-around tunnel field-effect transistor. J Appl Phys, 2010, 107: 024518

    Article  Google Scholar 

  5. Bhushan B, Nayak B, Rao V R. DC compact model for SOI tunnel field-effect transistors. IEEE Trans Electron Dev, 2012. 59: 2635–2642

    Article  Google Scholar 

  6. Wan J, Royer C L, Zaslavsky A, et al. A tunneling field effect transistor model combining interband tunneling with channel transport. J Appl Phys, 2011, 110: 104503

    Article  Google Scholar 

  7. Kim S H, Kam H, Hu C, et al. Germanium-source tunnel field effect transistors with record high ION/IOFF. In: Proceedings of Symposium on VLSI Technology, Kyoto, 2009. 178–179

    Google Scholar 

  8. Liu L, Mohata D, Datta S. Scaling length theory of double-gate interband tunnel field-effect transistors. IEEE Trans Electron Dev, 2012. 59: 902–908

    Article  Google Scholar 

  9. Zhang L N, He J, Chan M. A compact model for double-gate tunneling field-effect-transistors and its implications on circuit behaviors. In: Proceedings of IEEE International Electron Devices Meeting (IEDM), San Francisco, 2012. 681–684

    Google Scholar 

  10. Boucart K, Ionescu A M. Device design guidelines for nano-scale MuGFETs. Solid-State Electron, 2007, 51: 1500–1507

    Article  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Ru Huang.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Wang, C., Wu, C., Wang, J. et al. Analytical current model of tunneling field-effect transistor considering the impacts of both gate and drain voltages on tunneling. Sci. China Inf. Sci. 58, 1–8 (2015). https://doi.org/10.1007/s11432-014-5196-3

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s11432-014-5196-3

Keywords

关键词

Navigation