Skip to main content
Log in

Knowledge-based neural network SPICE modeling for MOSFETs and its application on 2D material field-effect transistors

  • Research Paper
  • Published:
Science China Information Sciences Aims and scope Submit manuscript

Abstract

As the traditional scaling of silicon metal-oxide-semiconductor field-effect transistors (MOSFETs) reaches its physical limit, research efforts on novel semiconductor devices are increasingly desired. To enable the joint optimization of early-stage circuit design and process of novel devices, the rapid creation of an accurate compact model of these devices with the capability to cover process variations is required. In this work, a knowledge-based neural network (KNN) modeling method is proposed. This method separates the geometrical variables from the other input variables of the device, where the geometrical variables are modeled with physics-based analytical equations, while the remaining part is modeled by an artificial neural network. The KNN model takes advantage of the automated numerical fitting capability of the neural network and the geometrical scalability from device physics. The created KNN model is first validated with silicon MOSFET data from the industry standard BSIM6 and shows more than 20% accuracy improvement as compared with the traditional neural network model. Furthermore, MoS2 field-effect transistors and circuits, such as ring oscillators, standard cells, and logic functional circuits, are experimentally fabricated for model verification. The results show that the KNN model is capable of predicting the electrical characteristics of devices beyond the measurement geometry and facilitates the accurate simulations of statistical circuits with respect to experimental data. This work paves the way for future circuit designs and simulations of novel semiconductor devices.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. Kuhn K. Variability in nanoscale CMOS technology. Sci China Inf Sci, 2011, 54: 936–945

    Article  Google Scholar 

  2. Wang J, Kim Y H, Ryu J, et al. Artificial neural network-based compact modeling methodology for advanced transistors. IEEE Trans Electron Devices, 2021, 68: 1318–1325

    Article  Google Scholar 

  3. Yang Q H, Qi G D, Gan W Z, et al. Transistor compact model based on multigradient neural network and its application in SPICE circuit simulations for gate-all-around Si cold source FETs. IEEE Trans Electron Devices, 2021, 68: 4181–4188

    Article  Google Scholar 

  4. Xu J J, Yagoub M C E, Ding R T, et al. Exact adjoint sensitivity analysis for neural-based microwave modeling and design. IEEE Trans Microwave Theor Techn, 2003, 51: 226–237

    Article  Google Scholar 

  5. Abo-Elhadeed A F. Modeling ballistic double gate MOSFETs using neural networks approach. In: Proceedings of the 8th Spanish Conference on Electron Devices, 2011. 1–4

  6. Fang M, He J, Zhang X K, et al. Neural network method to model nanoscale MOSFET characteristics. J Comput Theor Nanosci, 2012, 9: 2037–2041

    Article  Google Scholar 

  7. Lamamra K, Berrah S. Modeling of MOSFET transistor by MLP Neural Networks. In: Proceedings of International Conference on Electrical Engineering and Control Applications, 2017. 407–415

  8. Martinie S, Le Carval G, Munteanu D, et al. Impact of ballistic and quasi-ballistic transport on performances of double-gate MOSFET-based circuits. IEEE Trans Electron Dev, 2008, 55: 2443–2453

    Article  Google Scholar 

  9. Natori K. Ballistic metal-oxide-semiconductor field effect transistor. J Appl Phys, 1994, 76: 4879–4890

    Article  Google Scholar 

  10. Agarwal H, Gupta C, Dey S, et al. Anomalous transconductance in long channel halo implanted MOSFETs: analysis and modeling. IEEE Trans Electron Dev, 2017, 64: 376–383

    Article  Google Scholar 

  11. Aikawa H, Sanuki T, Sakata A, et al. Compact model for layout dependent variability. In: Proceedings of IEEE International Electron Devices Meeting, 2009. 1–4

  12. Choi Y S, Lian G, Vartuli C, et al. Layout variation effects in advanced MOSFETs: STI-induced embedded SiGe strain relaxation and dual-stress-liner boundary proximity effect. IEEE Trans Electron Dev, 2010, 57: 2886–2891

    Article  Google Scholar 

  13. Frank D J, Laux S E, Fischetti M V. Monte Carlo simulation of a 30 nm dual-gate MOSFET: how short can Si go? In: Proceedings of International Technical Digest on Electron Devices Meeting, 1992. 553–556

  14. Chow J C L, Leung M K K. Monte Carlo simulation of MOSFET dosimeter for electron backscatter using the GEANT4 code. Med Phys, 2008, 35: 2383–2390

    Article  Google Scholar 

  15. Desai S B, Madhvapathy S R, Sachid A B, et al. MoS2 transistors with 1-nanometer gate lengths. Science, 2016, 354: 99–102

    Article  Google Scholar 

  16. Theis T N, Solomon P M. It’s time to reinvent the transistor! Science, 2010, 327: 1600–1601

    Article  Google Scholar 

  17. Franklin A D. Nanomaterials in transistors: from high-performance to thin-film applications. Science, 2015, 349: 2750

    Article  Google Scholar 

  18. Lundstrom M. Moore’s law forever? Science, 2003, 299: 210–211

    Article  Google Scholar 

  19. Yu L, El-Damak D, Radhakrishna U, et al. Design, modeling, and fabrication of chemical vapor deposition grown MoS2 circuits with E-mode FETs for large-area electronics. Nano Lett, 2016, 16: 6349–6356

    Article  Google Scholar 

  20. Chen X Y, Xie Y F, Sheng Y C, et al. Wafer-scale functional circuits based on two dimensional semiconductors with fabrication optimized by machine learning. Nat Commun, 2021, 12: 5953

    Article  Google Scholar 

  21. Ma S L, Wu T X, Chen X Y, et al. An artificial neural network chip based on two-dimensional semiconductor. Sci Bull, 2022, 67: 270–277

    Article  Google Scholar 

  22. Li X F, Gao T T, Wu Y Q. Development of two-dimensional materials for electronic applications. Sci China Inf Sci, 2016, 59: 061405

    Article  Google Scholar 

  23. Tang H W, Zhang H M, Chen X Y, et al. Recent progress in devices and circuits based on wafer-scale transition metal dichalcogenides. Sci China Inf Sci, 2019, 62: 220401

    Article  Google Scholar 

  24. Wang R S, Yu T, Huang R, et al. Impacts of short-channel effects on the random threshold voltage variation in nanoscale transistors. Sci China Inf Sci, 2013, 56: 062403

    Article  Google Scholar 

  25. Takeuchi K, Fukai T, Tsunomura T, et al. Understanding random threshold voltage fluctuation by comparing multiple fabs and technologies. In: Proceedings of IEEE International Electron Devices Meeting, 2007. 467–470

  26. Chen J R, Odenthal P M, Swartz A G, et al. Control of Schottky barriers in single layer MoS2 transistors with ferromagnetic contacts. Nano Lett, 2013, 13: 3106–3110

    Article  Google Scholar 

  27. Kaushik N, Nipane A, Basheer F, et al. Schottky barrier heights for Au and Pd contacts to MoS2. Appl Phys Lett, 2014, 105: 113505

    Article  Google Scholar 

Download references

Acknowledgements

This work was supported in part by National Key Research and Development Program (Grant No. 2021YFA-1200500), Innovation Program of Shanghai Municipal Education Commission (Grant No. 2021-01-07-00-07-E00077), Shanghai Municipal Science and Technology Commission (Grant No. 21DZ1100900), Shanghai Pujiang Program (Grant No. 20PJ1400900), Natural Science Foundation of Shanghai (Grant No. 22ZR1403500), and Young Scientist Project of MOE Innovation Platform.

Author information

Authors and Affiliations

Authors

Corresponding authors

Correspondence to Peng Zhou, Wenzhong Bao or Ye Lu.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Qi, G., Chen, X., Hu, G. et al. Knowledge-based neural network SPICE modeling for MOSFETs and its application on 2D material field-effect transistors. Sci. China Inf. Sci. 66, 122405 (2023). https://doi.org/10.1007/s11432-021-3483-6

Download citation

  • Received:

  • Revised:

  • Accepted:

  • Published:

  • DOI: https://doi.org/10.1007/s11432-021-3483-6

Keywords

Navigation