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Face authentication with undercontrolled pose and illumination

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Abstract

Though face recognition gained significant attention and credibility in the last decade, quite few commercial applications are presently able to actually benefit from this. As a matter of fact, the high intra-class variability, mainly due to changes in pose and lighting, strongly hinders a wider diffusion of this biometry in real-world applications. In this paper, we propose FACE (Face Analysis for Commercial Entities), a framework for face recognition, which is robust to both pose and light variations, thanks to the implemented correction strategies. The framework also includes two separate indices for the quantitative assessment of these two kinds of distortions. They allow evaluating the conditions of the sample at hand before submitting it to the classifier. Moreover, FACE implements two reliability margins, which, differently from the preceding two, estimate the “acceptability” of the single response from the classifier. Experimental results show that FACE, thanks to its overcoming of problems due to pose and lighting variations, is able to provide an accuracy (in terms of Recognition Rate) which is better, in some respect, than the present state of art. On one side, corrections of pose and light allow FACE to achieve good results even in non-optimal conditions. On the other side, the integration of distortion measures and reliability margins into the recognition process allows to even improve such results, with a significant increase in system accuracy.

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Authors and Affiliations

  1. Sapienza Università di Roma, via Salaria 113, 00198, Rome, Italy

    Maria De Marsico

  2. Università di Salerno, via Ponte don Melillo, 84084, Fisciano, Italy

    Michele Nappi & Daniel Riccio

Authors
  1. Maria De Marsico
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  2. Michele Nappi
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  3. Daniel Riccio
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Correspondence to Maria De Marsico.

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De Marsico, M., Nappi, M. & Riccio, D. Face authentication with undercontrolled pose and illumination. SIViP 5, 401–413 (2011). https://doi.org/10.1007/s11760-011-0244-6

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  • DOI: https://doi.org/10.1007/s11760-011-0244-6

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