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A glance of technology efforts for design-for-manufacturing in nano-scale CMOS processes

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Abstract

This paper overviews design for manufacturing (DFM) for IC design in nano-CMOS technologies. Process/device issues relevant to the manufacturability of ICs in advanced CMOS technologies will be presented first before an exploration on process/device modeling for DFM is done. The discussion also covers a brief introduction of DFM-aware of design flow and EDA efforts to better handle the design-manufacturing interface in very large scale IC design environment.

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Authors and Affiliations

  1. Shanghai Research Institute of Microelectronics (SHRIME), Peking University, Shanghai, 201203, China

    YuHua Cheng

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  1. YuHua Cheng
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Correspondence to YuHua Cheng.

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Supported by the National Natural Science Foundation of China (Grant No. 60736030)

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Cheng, Y. A glance of technology efforts for design-for-manufacturing in nano-scale CMOS processes. Sci. China Ser. F-Inf. Sci. 51, 807–818 (2008). https://doi.org/10.1007/s11432-008-0054-9

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  • DOI: https://doi.org/10.1007/s11432-008-0054-9

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