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Fabrication and characteristics of ZnO thin films deposited by RF sputtering on plastic substrates for flexible display

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Abstract

ZnO thin films were successfully grown on flexible plastic substrates using radio-frequency magnetron sputtering method at room temperature. The effects of the sputtering power on the quality of the ZnO films have been investigated. The results show that thin films were polycrystalline, with wurtzite structure and a strong preferred c-axis orientation (002). The root-mean-square (rms) surface roughness of the ZnO thin films is 22.1 nm. The ZnO thin films fabricated by sputtering with 70 W sputtering power have a high mobility of 34.33 cm2/V·s. The ZnO films are shown to be compatible with flexible display on plastic substrates.

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Authors and Affiliations

  1. Institute of Microelectronics, Peking University, Beijing, 100871, China

    DeDong Han, Yi Wang, ShengDong Zhang, Lei Sun & RuQi Han

  2. Department of Electrical Engineering, Keio University, Keio, Japan

    Satoru Matsumoto & Yuji Ino

Authors
  1. DeDong Han
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  2. Yi Wang
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  3. ShengDong Zhang
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  4. Lei Sun
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  5. RuQi Han
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  6. Satoru Matsumoto
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  7. Yuji Ino
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Correspondence to Yi Wang or Lei Sun.

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Han, D., Wang, Y., Zhang, S. et al. Fabrication and characteristics of ZnO thin films deposited by RF sputtering on plastic substrates for flexible display. Sci. China Inf. Sci. 55, 1441–1445 (2012). https://doi.org/10.1007/s11432-011-4348-y

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  • DOI: https://doi.org/10.1007/s11432-011-4348-y

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