Paper
6 March 2013 An elliptic phase-shift algorithm for high speed three-dimensional profilometry
Fuqin Deng, Zhao Li, Jia Chen, Jiangwen Deng, Kenneth S. M. Fung, Edmund Y. Lam
Author Affiliations +
Proceedings Volume 8661, Image Processing: Machine Vision Applications VI; 86610S (2013) https://doi.org/10.1117/12.2001417
Event: IS&T/SPIE Electronic Imaging, 2013, Burlingame, California, United States
Abstract
A high throughput is often required in many machine vision systems, especially on the assembly line in the semiconductor industry. To develop a non-contact three-dimensional dense surface reconstruction system for real-time surface inspection and metrology applications, in this work, we project sinusoidal patterns onto the inspected objects and propose a high speed phase-shift algorithm. First, we use an illumination-reflectivity-focus (IRF) model to investigate the factors in image formation for phase-measuring profilometry. Second, by visualizing and analyzing the characteristic intensity locus projected onto the intensity space, we build a two-dimensional phase map to store the phase information for each point in the intensity space. Third, we develop an efficient elliptic phase-shift algorithm (E-PSA) for high speed surface profilometry. In this method, instead of calculating the time-consuming inverse trigonometric function, we only need to normalize the measured image intensities and then index the built two-dimensional phase map during real-time phase reconstruction. Finally, experimental results show that it is about two times faster than conventional phase-shift algorithm.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fuqin Deng, Zhao Li, Jia Chen, Jiangwen Deng, Kenneth S. M. Fung, and Edmund Y. Lam "An elliptic phase-shift algorithm for high speed three-dimensional profilometry", Proc. SPIE 8661, Image Processing: Machine Vision Applications VI, 86610S (6 March 2013); https://doi.org/10.1117/12.2001417
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KEYWORDS
Reconstruction algorithms

Algorithm development

Calibration

Imaging systems

Inspection

Reflectivity

Semiconductors

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