Abstract
Negative Bias Temperature Instability (NBTI) is one of the major transistor aging effects, possibly leading to timing failures during run-time of a system. Thus one is interested in predicting this effect during design time. In this work an Abstraction NBTI model is introduced reducing the state space of trap-based NBTI models using two abstraction parameters, applying a state transformation to incorporate variable stress conditions. This transformation is faster than traditional approaches. Currently the conversion into estimated threshold voltage damages is a very time consuming process.
Funding source: Deutsche Forschungsgemeinschaft
Award Identifier / Grant number: DFG-GRK 1765/2
Funding statement: This research is funded by the German Research Foundation through the Research Training Group “SCARE: System Correctness under Adverse Conditions” (DFG-GRK 1765/2), https://www.uni-oldenburg.de/en/scare/. The simulations were partly performed on the HPC Cluster CARL at the University of Oldenburg (Germany), funded by the DFG through its Major Research Instrumentation Program (INST 184/157-1 FUGG) and the Ministry of Science and Culture (MWK) of the Lower Saxony State.
About the authors
Stephan Adolf received a B. Sc. in Chemistry and Physics, B. Sc in Computer Science and a M. Ed. in Chemistry and Physics. In 2018 he joined the RTG SCARE and started working on NBTI aging in the Division of Embedded Hardware/Software Systems at the University of Oldenburg.
Wolfgang Nebel is full professor at the University of Oldenburg. He holds a Dipl.-Ing. in EE and a Dr.-Ing. degree in CS. Nebel is IEEE fellow and spokesperson of the ICT Section of the German National Academy of Science and Engineering. He served for 15 years as Chairman of the OFFIS – Institute of Information Technology. He is Chairman of edacentrum and a member of the Main Board of bitkom and its-mobility.
Acknowledgment
The author thanks Kim Grüttner for proofreading the manuscript of the paper.
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