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View all- Rodrigues RKundu S(2011)Model based double patterning lithography (DPL) and simulated annealing (SA)2011 12th International Symposium on Quality Electronic Design10.1109/ISQED.2011.5770754(1-8)Online publication date: Mar-2011
Display Omitted We demonstrated two double patterning (DP) processes in nanoimprint lithography.As this work was a proof-of-concept, we used commercially available resins.Despite difficulties arising with respect to pattern deformation, the second ...
The presented paper describes a novel process using inkjet printing to pattern a conformal (built-on) mask onto photoresist for further microstructure formation. The advantages of using the inkjet printing conformal mask include no Cr photomask required,...
Double patterning lithography (DPL) is one of the most promising solutions for the 28nm technology node and beyond. The main idea of DPL is to decompose the layout into two sub-patterns and manufacture the layout by two masks. In addition to traditional ...
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