research-article

Stitch-aware routing for multiple e-beam lithography

Authors:

Yao-Wen ChangAuthors Info & Claims

DAC '13: Proceedings of the 50th Annual Design Automation Conference

Article No.: 25, Pages 1 - 6

https://doi.org/10.1145/2463209.2488765

Published: 29 May 2013 Publication History

Abstract

Multiple e-beam lithography (MEBL) is one of the most promising next generation lithography (NGL) technologies for high volume manufacturing, which improves the most critical issue of conventional single e-beam lithography, throughput, by simultaneously using thousands or millions of e-beams. For parallel writing in MEBL, a layout is split into stripes and patterns are cut by stripe boundaries, which are defined as stitching lines. Critical patterns cut by stitching lines could suffer from severe pattern distortion or even yield loss. Therefore, considering the positions of stitching lines and avoiding stitching line-induced bad patterns are required during layout design. In this paper, we propose the first work of stitch-aware routing framework for MEBL based on a two-pass bottom-up multilevel router. We first identify three types of stitching line-induced bad patterns which should not exist in an MEBL-friendly routing solution. Then, stitch-aware routing algorithms are respectively developed for global routing, layer/track assignment and detailed routing. Experimental results show that our stitch-aware routing framework can effectively reduce stitching line-induced bad patterns and thus may not only improve the manufacturability but also facilitate the development of MEBL.

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Cited By

Lin YYu BZou YLi ZAlpert CPan D(2017)Stitch aware detailed placement for multiple E-beam lithographyIntegration10.1016/j.vlsi.2017.02.00458(47-54)Online publication date: Jun-2017
https://doi.org/10.1016/j.vlsi.2017.02.004
Lin PPai YChiu YFang SChen CFanucci LTeich J(2016)Lossless compression algorithm based on dictionary coding for multiple e-beam direct write systemProceedings of the 2016 Conference on Design, Automation & Test in Europe10.5555/2971808.2971873(285-288)Online publication date: 14-Mar-2016
https://dl.acm.org/doi/10.5555/2971808.2971873
Yu BYuan KGao JHu SPan D(2016)EBL Overlapping Aware Stencil Planning for MCC SystemACM Transactions on Design Automation of Electronic Systems10.1145/288839421:3(1-24)Online publication date: 16-May-2016
https://dl.acm.org/doi/10.1145/2888394
Show More Cited By

Index Terms

Stitch-aware routing for multiple e-beam lithography
1. Hardware
  1. Electronic design automation
    1. Physical design (EDA)

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cover image ACM Conferences

DAC '13: Proceedings of the 50th Annual Design Automation Conference

May 2013

1285 pages

ISBN:9781450320719

DOI:10.1145/2463209

Copyright © 2013 ACM.

Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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EDAC: Electronic Design Automation Consortium
SIGDA: ACM Special Interest Group on Design Automation
IEEE-CEDA

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SIGBED: ACM Special Interest Group on Embedded Systems

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Association for Computing Machinery

New York, NY, United States

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Published: 29 May 2013

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DAC '13: The 50th Annual Design Automation Conference 2013

May 29 - June 7, 2013

Texas, Austin

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Overall Acceptance Rate 1,770 of 5,499 submissions, 32%

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Cited By

Lin YYu BZou YLi ZAlpert CPan D(2017)Stitch aware detailed placement for multiple E-beam lithographyIntegration10.1016/j.vlsi.2017.02.00458(47-54)Online publication date: Jun-2017
https://doi.org/10.1016/j.vlsi.2017.02.004
Lin PPai YChiu YFang SChen CFanucci LTeich J(2016)Lossless compression algorithm based on dictionary coding for multiple e-beam direct write systemProceedings of the 2016 Conference on Design, Automation & Test in Europe10.5555/2971808.2971873(285-288)Online publication date: 14-Mar-2016
https://dl.acm.org/doi/10.5555/2971808.2971873
Yu BYuan KGao JHu SPan D(2016)EBL Overlapping Aware Stencil Planning for MCC SystemACM Transactions on Design Automation of Electronic Systems10.1145/288839421:3(1-24)Online publication date: 16-May-2016
https://dl.acm.org/doi/10.1145/2888394
Yibo Lin Yu BYi Zou Li ZAlpert CPan D(2016)Stitch aware detailed placement for multiple e-beam lithography2016 21st Asia and South Pacific Design Automation Conference (ASP-DAC)10.1109/ASPDAC.2016.7428009(186-191)Online publication date: Jan-2016
https://doi.org/10.1109/ASPDAC.2016.7428009
Yu BPan DYu BPan D(2016)Design for Manufacturability with E-Beam LithographyDesign for Manufacturability with Advanced Lithography10.1007/978-3-319-20385-0_5(111-157)Online publication date: 2016
https://doi.org/10.1007/978-3-319-20385-0_5
Chang YLiu RFang S(2015)EUV and e-beam manufacturabilityProceedings of the 52nd Annual Design Automation Conference10.1145/2744769.2747925(1-6)Online publication date: 7-Jun-2015
https://dl.acm.org/doi/10.1145/2744769.2747925
Iou-Jen Liu Shao-Yun Fang Yao-Wen Chang (2015)Stitch-Aware Routing for Multiple E-Beam LithographyIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2014.238576134:3(471-482)Online publication date: Mar-2015
https://doi.org/10.1109/TCAD.2014.2385761

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