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Layout Decomposition with Pairwise Coloring and Adaptive Multi-Start for Triple Patterning Lithography

Published: 02 December 2015 Publication History

Abstract

In this article we present a pairwise coloring (PWC) approach to tackle the layout decomposition problem for triple patterning lithography (TPL). The main idea is to reduce the problem to a set of bi-coloring problems. The overall solution is refined by applying a bi-coloring method for pairs of color sets per pass. One obvious advantage of this method is that the existing double patterning lithography (DPL) techniques can be reused effortlessly. Moreover, we observe that each pass can be fulfilled efficiently by integrating an SPQR-tree-graph-division-based bi-coloring method. In addition, to prevent the solution getting stuck in the local minima, an adaptive multi-start (AMS) approach is incorporated. Adaptive starting points are generated according to the vote of previous solutions. The experimental results show that our method is competitive with other works on both solution quality and runtime performance.

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Cited By

View all
  • (2024)Scalable layout decomposition implemented by a distribution evolutionary algorithmIntegration10.1016/j.vlsi.2023.10212595(102125)Online publication date: Mar-2024
  • (2018)Recent Research and Challenges in Multiple Patterning Layout Decomposition2018 IEEE Computer Society Annual Symposium on VLSI (ISVLSI)10.1109/ISVLSI.2018.00096(498-499)Online publication date: Jul-2018
  • (2017)Multiple Patterning Layout Decomposition Considering Complex Coloring Rules and Density BalancingIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2017.268106836:12(2080-2092)Online publication date: Dec-2017

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  1. Layout Decomposition with Pairwise Coloring and Adaptive Multi-Start for Triple Patterning Lithography

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    Published In

    cover image ACM Transactions on Design Automation of Electronic Systems
    ACM Transactions on Design Automation of Electronic Systems  Volume 21, Issue 1
    November 2015
    464 pages
    ISSN:1084-4309
    EISSN:1557-7309
    DOI:10.1145/2852253
    • Editor:
    • Naehyuck Chang
    Issue’s Table of Contents
    Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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    Publication History

    Published: 02 December 2015
    Accepted: 01 April 2015
    Revised: 01 March 2015
    Received: 01 December 2014
    Published in TODAES Volume 21, Issue 1

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    Author Tags

    1. Adaptive multi-start
    2. design for manufacturability
    3. layout decomposition
    4. pairwise coloring
    5. triple patterning lithography

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    Funding Sources

    • National Natural Science Foundation of China
    • SRC
    • Shanghai Science and Technology Committee
    • NSF
    • National Basic Research Program of China

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    Cited By

    View all
    • (2024)Scalable layout decomposition implemented by a distribution evolutionary algorithmIntegration10.1016/j.vlsi.2023.10212595(102125)Online publication date: Mar-2024
    • (2018)Recent Research and Challenges in Multiple Patterning Layout Decomposition2018 IEEE Computer Society Annual Symposium on VLSI (ISVLSI)10.1109/ISVLSI.2018.00096(498-499)Online publication date: Jul-2018
    • (2017)Multiple Patterning Layout Decomposition Considering Complex Coloring Rules and Density BalancingIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2017.268106836:12(2080-2092)Online publication date: Dec-2017

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