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An Effective Layout Decomposition Method for DSA with Multiple Patterning in Contact-Hole Generation

Published: 21 September 2017 Publication History

Abstract

Directed self-assembly (DSA) complemented with multiple patterning (MP) is an attractive next generation lithography (NGL) technique for contact-hole generation. Nevertheless, a high-quality DSA-aware layout decomposer is required to enable the technology. In this article, we introduce an efficient method which incorporates a set packing for generating DSA template candidates and a local search method. Besides, a multi-start strategy is integrated into the framework to prevent the local minima. Our framework encourages the reuse of existing coloring solvers. Hence, the development cost can significantly be reduced. In addition, for DSA multiple patterning where the number of masks is larger than two, we present an efficient iterative partition based method. Experimental results show that compared with the state-of-the-art work, our methods can achieve roughly 100× speedup for double patterning, and 78.8% conflict reduction with 5× speedup for triple patterning on the dense graphs.

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  • (2023)Multiple patterning via layout decomposition method for directed self-assembly lithographyJournal of Micro/Nanopatterning, Materials, and Metrology10.1117/1.JMM.22.4.04300122:04Online publication date: 1-Oct-2023
  • (2023)Enhanced and Efficient Guiding Template Design for Lamellar DSA With Graph MonomorphismIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2023.326939242:11(4329-4333)Online publication date: 1-Nov-2023
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  1. An Effective Layout Decomposition Method for DSA with Multiple Patterning in Contact-Hole Generation

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    Published In

    cover image ACM Transactions on Design Automation of Electronic Systems
    ACM Transactions on Design Automation of Electronic Systems  Volume 23, Issue 1
    January 2018
    279 pages
    ISSN:1084-4309
    EISSN:1557-7309
    DOI:10.1145/3129756
    • Editor:
    • Naehyuck Chang
    Issue’s Table of Contents
    Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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    Publication History

    Published: 21 September 2017
    Accepted: 01 July 2017
    Revised: 01 May 2017
    Received: 01 November 2016
    Published in TODAES Volume 23, Issue 1

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    Author Tags

    1. Design for manufacturability
    2. directed self-assembly
    3. iterative partition
    4. multiple patterning
    5. multiple start points
    6. set packing

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    • Refereed

    Funding Sources

    • National Natural Science Foundation of China (NSFC)
    • NSF
    • National Key Research and Development Program
    • SRC
    • Recruitment Program of Global Experts (the Thousand Talents Plan)

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    Cited By

    View all
    • (2023)Multiple patterning via layout decomposition method for directed self-assembly lithographyJournal of Micro/Nanopatterning, Materials, and Metrology10.1117/1.JMM.22.4.04300122:04Online publication date: 1-Oct-2023
    • (2023)Enhanced and Efficient Guiding Template Design for Lamellar DSA With Graph MonomorphismIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2023.326939242:11(4329-4333)Online publication date: 1-Nov-2023
    • (2022)An Innovation Framework of Medical Organic Cannabis Traceability in Digital Supply ChainJournal of Open Innovation: Technology, Market, and Complexity10.3390/joitmc80401968:4(196)Online publication date: 31-Oct-2022
    • (2021)Novel Guiding Template and Mask Assignment for DSA-MP Hybrid Lithography Using Multiple BCP MaterialsIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2020.303374540:9(1909-1919)Online publication date: Sep-2021
    • (2019)Novel Guiding Template and Mask Assignment for DSA-MP Hybrid Lithography Using Multiple BCP MaterialsProceedings of the 56th Annual Design Automation Conference 201910.1145/3316781.3317871(1-6)Online publication date: 2-Jun-2019
    • (2019)Combining lithography and Directed Self Assembly for the manufacturing of vias: Connections to graph coloring problems, Integer Programming formulations, and numerical experimentsEuropean Journal of Operational Research10.1016/j.ejor.2019.07.021Online publication date: Jul-2019
    • (2018)Guiding Template-Induced Design Challenges in DSA-MP Lithography2018 IEEE Computer Society Annual Symposium on VLSI (ISVLSI)10.1109/ISVLSI.2018.00097(500-502)Online publication date: Jul-2018

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